13761090949
當(dāng)前位置：首頁 > 產(chǎn)品中心 > 二維材料 > 六方氮化硼 > CVD銅基單層氮化硼薄膜
簡(jiǎn)要描述：Single layer h-BN （Boron Nitride） monolayer thick film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct band gap of 6 eV with strong ionic bonding between B-N atoms.
產(chǎn)品型號(hào)： 廠商性質(zhì)：生產(chǎn)廠家更新時(shí)間：2024-06-03訪 問 量：1458詳細(xì)介紹
Single layer h-BN (Boron Nitride) monolayer thick film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct band gap of 6 eV with strong ionic bonding between B-N atoms. Our h-BN CVD process has been adopted in order that defect density has been kept low (~1E10-1E11 cm-2) and single domain sizes have been increased to reduce 1D grain boudary defect concentrations. Monolayer h-BN sheets measure ~5cm x 5cm or ~2x2 inches in size.
Properties of h-BN
Single layer h-BN (Boron Nitride) monolayer thick film is grown onto 50 um thick copper foils. h-BN is an insulator with a direct band gap of 6 eV with strong ionic bonding between B-N atoms. Our h-BN CVD process has been adopted in order that defect density has been kept low (~1E10-1E11 cm-2) and single domain sizes have been increased to reduce 1D grain boudary defect concentrations. Monolayer h-BN sheets measure ~5cm x 5cm or ~2x2 inches in size.
Properties of h-BN
產(chǎn)品咨詢
聯(lián)系我們
上海巨納科技有限公司 公司地址：上海市虹口區(qū)寶山路778號(hào)海倫國(guó)際大廈5樓 技術(shù)支持：化工儀器網(wǎng)掃一掃 更多精彩
微信二維碼
網(wǎng)站二維碼
歡迎來到